Pevonia Clarifyl Purifying Skin Mask
Description for
Pevonia Clarifyl Purifying Skin Mask:
Containing a high concentration of active ingredients such as glycolic acid, zinc oxide, and camphor, this mask provides immediate visible results in breakout-prone skin. Healing, soothing, purifying and tightening, it has antiseptic properties and serves as a bacteria suppressor.
Pevonia products cannot be shipped outside the U.S.
Ingredients for
Pevonia Clarifyl Purifying Skin Mask:
Water (Aqua), Glycerin, Bentonite, Glyceryl Stearate, Zinc Oxide, Glycolic Acid, Salicylic Acid, Aloe Barbadensis Leaf Gel, Panthenol, Sulfur, Anthemis Nobilis (Chamomile) Flower Oil, Cinnamomum Camphora (Camphor) Wood Extract, Phenoxyethanol, Dimethicone, Capryl Glycol, Ethylhexylglycerin, Hexylene Glycol.
Directions for
Pevonia Clarifyl Purifying Skin Mask:
After cleansing and toning, blot the skin dry and apply the Problematic Skin Care Cream. Follow with a thin layer of this mask all over your face and neck, half an inch away from the eyes and leave on for 10 minutes. Rinse with cool water and apply the Problematic Skin Lotion, followed by the Problematic Skin Cream. Use once or twice a week.
Restrictions:
This product can only be shipped to addresses within the U.S.
DOT Restrictions:
There are no restrictions on the delivery of this item - you may elect to have
this item sent Next Day, 2 Day, or through our standard delivery method.
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